NANOMO researchers participating in development of new sample environments for synchrotron radiation facilities

NANOMO researchers (Samuli Urpelainen, from ATMOS research group)  and alumni (Esko Kokkonen, from MAX IV Laboratory) are participating in a project developing novel sample environments for studying atomic layer deposition (ALD) in situ / operando in a collaboration between MAX IV Laboratory, University of Helsinki and Lund University. The new sample environment, mimicking an ALD reactor allows monitoring chemical reactions during thin film growth in real time using ambient pressure x-ray photoelectron spectroscopy.

Read the full story here.

Last updated: 22.4.2020